Sumários
Atomic Layer Deposition
3 dezembro 2019, 08:00 • Amélia Almeida
Atomic layer deposition. Basic principles and mechanisms of film formation. Advantages and disadvantages. Examples and applications.
Thin Film Deposition by PVD and CVD
28 novembro 2019, 09:00 • Amélia Almeida
Plasma-assisted PVD processes: Ion Plating and Pulsed Laser Deposition. Mechanisms, materials and applications. General advantages of PVD processes. Chemical Vapour Deposition (CVD). Principles, film deposition mechanisms and reaction steps. CVD methods (conventional and plasma-assisted methods). Examples of CVD deposited materials and typical precursor and reactions involved. Constitution of a CVD reactor and types of CVD reactors. Laser-CVD and its applications. Deposition temperature in thin film deposition methods.
Development of Lab Projects
27 novembro 2019, 12:30 • João Salvador Fernandes
Development of Lab Projects